Ethos NX5000 Focused Ion Beam System
Unsurpassed Performance with Ultimate Flexibility
This product is available from Milexia France and Milexia Iberica
Focused Ion and Electron Beam System Ethos NX5000 Series
The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability.
Ethos delivers high-resolution imaging at low voltages combined with ion optics for nanoscale precision processing.
High-Performance FE-SEM Column with Dual Lens Mode
- Ultra-high-resolution observation (HR mode: semi-in-lens)
- High-accuracy end-point detection in real time (FF mode: Field Free (time sharing mode))
High-Throughput Material Processing
- Ultra-fast processing with high ion-current density (Max. beam current: 100 nA)
- User programmable script for auto processing and observation
Microsampling System
- Fully integrated sample-orientation control for Anti-Curtaining Effect (ACE technology)
- TEM sample preparation for uniform lamellas at any orientation
Triple-Beam Capable, Delivering Advanced Quality Results
- Low-acceleration noble-gas ion-beam material processing
- Innovative functions reduce Ga ion related and other milling artifacts
Large Multi-Port Chamber and Stage for Various Applications
- Large sample size capable system with exceptional stage stability
- Full range enhanced long-distance tracking (155 x 155mm)