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NX-2000 Focused Icon Beam System

FIP-SEM for large samples up to 200mm

This product is available from Milexia France and Milexia Iberica

FIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials.

An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies.

The HITACHI Focused Icon Beam System (FIB) NX-2000 is equipped with three guns. The high current density ion column (up to 100nA) is vertical. The ultra-high resolution electron column has a new generation cold emission gun allowing observation of the thinned area in real time. A third gun emitting Argon ions considerably reduces the radiation damage usually seen with Gallium ions.  

The 200mm X 200mm travel stage, the patented “Micro Sampling” device and multiple gas injection possibilities complete the features of the Hitachi NX2000 FIB. 

FIB column  

  • Resolution (SIM): 4 nm 30 kV, 60 nm 2 kV
  • Accelerating voltage: 0,5 kV – 30 kV
  • Beam current:  0,05 pA – 100 nA
  • Max. beam current density: 54 A/cm2
  • Aperture: Automated – 15 positions
  • Min. dwell time: 10 ns 

 FE-SEM column 

  • Resolution: 2,8 nm 5 kV, 3,5 nm 1kV
  • Accelerating voltage: 0,5 kV – 30 kV
  • Electron source: Cold cathode field emission source
  • Real-time monitoring: Optics enabled for live fabrication
  • Detector 
  • Standard detector: Upper/Lower SED & BSED 

Stage 

  • X: 0-205 mm
  • Y: 0-205 mm
  • Z: 0-10 mm
  • θ: 0-360° continuous
  • γ: -5 – 60° 

 

Features and variations

  • Ar/Xe ion 3rd column
  • Micro-sampling system
  • Multi-gas injection system.
  • Swing function (for Ar/Xe ion 3rd column)
  • TEM sample preparation wizard
  • Automatic TEM sample prepartion software
  • CAD navigation software
  • Linkage software with defect inspection instruments
  • EDS (Energy Dispersive X-Ray Spectroscopy) system
  • Plasma cleaner

Características

  • Columna 3.ª de iones Ar/Xe
  • Sistema de micro-muestreo
  • Sistema de inyección de gas múltiple
  • Función de oscilación (para la 3.ª columna de iones Ar/Xe)
  • Asistente para preparación de muestras TEM
  • Software automático de preparación de muestras TEM
  • Software de navegación CAD
  • Software de enlace con instrumentos de inspección de defectos
  • Sistema EDS (Espectroscopía de Rayos X de Energía Dispersiva)
  • Limpiador de plasma

Resources

    Download the Brochure NX2000

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